It is imperative that photomasks made from expensive materials be cleaned carefully and without damage. FEBACS contributes to the solution with cleaning technology that has been accumulated and refined over many years.

• Fast scrub cleaning, rinsing, and drying of work with a single unit.
• Various cleaning tools can be built in. For detailed cleaning.
• Compatible with the use of alkali and surface active agents.
• Both a single substrate cleaner and spin cleaner are available.