Makes safe, efficient cleaning possible, and greatly reduces maintenance time

Because improper processing and direct damage to substrates may occur when the HF crystals in SiO/SiO etching crystallize and accumulate within the equipment's fluid contact sections, extensive washing performed through regular maintenance was indispensable.

However, because such long-term washing involved the circulation of hot DI water, such relatively smaller areas as the inside of piping and lower tanks were not washed sufficiently. In addition, there was the problem of the danger posed by the HF crystals themselves, so it cannot be said that sufficient measures were taken at all.

At FEBACS, in order to resolve such problems from their very roots, we offer a cleaning solution that works to dissolve HF crystals.

Because the HF crystals are dissolved through simple circulation* of the cleaning solution, safe, efficient washing is made possible and the time required for maintenance is greatly reduced.

* The circulation time and amount of cleaning solution required will differ depending on the amount of HF crystals in the piping system.

	Input the HF cleaning solution into the lower tank and perform temperature-controlled circulation. (Repeat as required according to the amount of debris in the piping system.) Circulate DI water to flush out the cleaning solution.
	Reduction in improper processing caused by HF crystals Reduction of direct substrate damage caused by HF crystals Efficiency through shortened maintenance times Improvement of utilization rate