Demand is rapidly growing for “thin” televisions. In order to win out in this market, considered to be worth 30 trillion yen, a reduction in the running costs for FPD manufacturing processes is an absolute imperative.

FEBACS has responded promptly to the trend towards this type of market by developing a high performance, low-priced chemical control system.

Accurately determining the proper concentration of chemicals that are characteristic of expensive etchant and controlling their concentration at a constant rate results in a reduction in chemical consumption and stabilization of the corresponding processes. Moreover, the subsequent reduction in the amount of waste fluid generated contributes to preventing environmental pollution.

• Piping is added in order to sample processing chemicals from the circulation line.
• A concentration monitor is installed and the concentration of sample solutions is measured.
• A newly installed controller manages the volume of chemical replenishment.
• High concentration chemical solutions are replenished from a supply unit and the resulting concentration is controlled.

• Stabilized processes
• Longer chemical replenishment cycles
• Large reduction in running costs
• Large reduction in the amount of waste fluid

• Multiple sampling is possible
• Measurement of concentration is possible for different chemicals
• Space-saving design
• Simple compatibility with FEBACS' “CrystalFlow”

1. Data mining is possible
2. Determination and setting of optimum conditions is supported
3. The causes of processing errors are investigated with the most direct route possible

(Titration + Absorbance type)

LCD & semiconductor Cr etching Al etching ITO etching TMAH developer Cleaning (HF, alkali solution, etc.) Crystal Fluorine, buffered fluorine Printed wiring board Various processing solutions

Steel Acid, alkaline, iron, amine, etc. Metal surface processing such as plating, etc. Ni, Cr, Fe, Cu, Al, Ti, acid Foodstuffs PET bottle (for beverages) sterilizer Drainage (environmental control) Hexavalent chromium (Cr[VI]), etc.

Can be used for various other applications as well.

(Titration type only)

Etching solutions

• HF (fluoride)
• Mixed acid etching (mixed acid)
• PAN etching (phosphoric acid, nitric acid, acetic acid)
• Nitride etching (high temperature phosphoric acid)
• ITO etching (nitric acid, hydrochloric acid)
• BHF (fluoride, NHF4)
• Glycol etching (fluoride, moisture)
• Others

Cleaning solutions

• SC1 (hydrogen peroxide, ammonium hydroxide)
• SC2 (hydrogen peroxide, hydrochloric acid)
• SPM (sulfuric acid, hydrogen peroxide)
• SOM (sulfuric acid, ozonized water)
• HF/Ozone (fluoride, ozonized water)
• TMAH
• Others
• CMP slurry
• CMP slurry (hydrogen peroxide)
• CMP slurry (iron nitrate)

CMP slurry (iron nitrate)

• Copper plating solution (inorganic/organic compounds)
• IPA (moisture)
• Quartz cleaning (fluoride, nitric acid)
• Rinse water monitoring
• Drainage/Sewage monitoring

Other applications

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